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1/f noise measurements in n-channel MOSFETs processed in 0.25 μm technology
1/f noise measurements in n-channel MOSFETs processed in 0.25 μm technology
2002
Y. Akue Allogo
M. de Murcia
J.C. Vildeuil
M. Valenza
P. Llinares
D. Cottin
Keywords:
Chemistry
Electronic engineering
Optoelectronics
Infrasound
Communication channel
Correction
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