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ADVANCES IN HIGH-K GATE DIELECTRIC AND METAL GATE TECHNOLOGY USING ATOMIC LAYER CVD^
ADVANCES IN HIGH-K GATE DIELECTRIC AND METAL GATE TECHNOLOGY USING ATOMIC LAYER CVD^
2002
H. De Waard
C. Werkhoven
Jan Willem Maes
Z. M. Rittersma
D Massoubre
Keywords:
Gate oxide
Materials science
High-κ dielectric
Metal gate
Gate dielectric
Electronic engineering
Optoelectronics
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