A method of making a mask assembly, and using the mask assembly

It is proposed a method of making a mask assembly, the mask assembly for additively forming organic semiconductor material regions acts on a substrate. The central idea of ​​the present fabrication method for a mask assembly (10) that on a mask support area (20) applying a photo-crosslinkable polymer material (30), controlled and selectively exposed and thereby structured and is subsequently developed. Through the development will not be exposed, and thus not photo cross-linked polymer material areas (30 '') of surface portions (20a) of the mask support frame (20) is removed, so that the desired mask assembly (10) is formed.