Design and manufacture on multilayers of low-Z materials at 14 nm

In order to decrease the bandwidth of the normal multilayers and improve the spectral resolution,several kinds of multilayers composed of low-Z materials were investigated in extreme ultraviolet and soft X-ray regions.Firstly,three kinds of multilayers of low-Z materials,Si/B4C,Si/C and Si/SiC multilayers were chosen at the wavelength of 14 nm and these multilayers and a normal Mo/Si multilayer were designed by using a random search method.Then all these multilayers were fabricated with a DC magnetron sputtering system and the thicknesses were measured by an X-ray diffractometer.Finally,the reflectivities of multilayers were measured by the synchrotron radiation.The synchrotron radiation tests show that the largest bandwidth of these multilayers is from the Mo/Si multilayer in 0.57 nm,and the smallest one is from Si/SiC multilayer in 0.18 nm.The results correspond with the design and demonstrate that the bandwidths of multilayers of low-Z materials are narrower than that of the normal Mo/Si multilayer and the multilayers of low-Z materials can achieve a higher spectral resolution.