Effects of B or Al Interface Layers on Thermal Stability of Ni Silicide on Si

Stability of Ni Silicide on Si K. Tsutsui, T. Shiozawa, K. Nagahiro, Y. Ohishi, K. Kakushima, P. Ahmet, N. Urushihara, M. Suzuki, and H. Iwai Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Frontier Collaborative Research Center, Tokyo Institute of Technology 4259 Nagatsuta, Midoriku, Yokohama 226-8502, Japan, ULVAC-PHI Inc. 370 Enzo, Chigasaki, Kanagawa 253-8522, Japan