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Development of MOCVD Equipment on the Basis of Ultra-High Vacuum Technique
Development of MOCVD Equipment on the Basis of Ultra-High Vacuum Technique
1985
Toshio Hayashi
Kazuhiro Kuwahara
Seisho Ohwa
Souji Komiya
Keywords:
Metalorganic vapour phase epitaxy
Ultra-high vacuum
Analytical chemistry
Chemistry
Optoelectronics
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