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Impact of Pad Material Properties on CMP Performance for Sub-10nm Technologies
Impact of Pad Material Properties on CMP Performance for Sub-10nm Technologies
2019
Aniruddh Khanna
Raghava Kakireddy
Puneet Jawali
Ashwin Chockalingam
Daniel Redfield
Rajeev Bajaj
Jason Garcheung Fung
Mario Cornejo
Mayu Yamamura
Zhibo Yuan
Chris Orilall
Boyi Fu
Gana Ganapathi
Fred C. Redeker
Nag B. Patibandla
Keywords:
Material properties
Nanotechnology
Inorganic chemistry
Chemistry
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