Method and system for controlling plasma in semiconductor fabrication
2016
A plasma processing system and a method for controlling a plasma in semiconductor fabrication are provided. The system includes a remote plasma module configured to generate plasma. The system further includes a compound mixing chamber configured to receive the plasma. The system also includes a processing chamber configured to receive the plasma from the compound mixing chamber for processing. In addition, the system includes a detection module configured to monitor the plasma in the compound mixing chamber.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
1
References
0
Citations
NaN
KQI