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Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs
Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs
2014
François Andrieu
Mikael Casse
E. Baylac
P. Perreau
Olivier Nier
D. Rideau
R. Berthelon
F. Pourchon
A. Pofelski
B. De Salvo
C. Gallon
Vincent Mazzocchi
D. Barge
C. Gaumer
Olivier Gourhant
A. Cros
V. Barral
R. Ranica
N. Planes
Walter Schwarzenbach
E. Richard
E. Josse
O. Weber
F. Arnaud
Maud Vinet
O. Faynot
M. Haond
Keywords:
Electronic engineering
Materials science
Substrate (chemistry)
Analytical chemistry
Planar
Communication channel
Strain (chemistry)
Correction
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