Optimization of oxygen on Nb-doped TiO2 using DC and RF magnetron sputtering using composite and metal target

The Nb-doped TiO2 (NTO) thin films were successfully deposited on glass substrate by TiO2 composite and Nb metal target using RF and DC magnetron sputtering technique by varying the O2 flow rate from 2-10sccm. The effects of electrical, optical and structural properties of NTO thin film were studied. The resistivity of the sample increased from 129.4 to 452.9 Ω.cm with increasing O2 flow-rate from 2 to 10 sccm. The films exhibited a high transparency of over 66.5%–86.8% in the visible region. The lowest band gap energy of 3.10eV is obtained at an O2 flow-rate of 5 sccm.