Preparation technology for Ni submicron arrays

The invention provides a preparation technology for Ni submicron arrays. The preparation technology comprises the steps: firstly, carrying out cleaning pretreatment on a substrate and an Ni target material; then depositing an Ni layer on the substrate; next, carrying out heat treatment on a template after deposition; finally dissolving the template with an alkali solution, after the template is removed, washing with deionized water, and thus obtaining the Ni submicron arrays. Compared with the prior art, the technology has the beneficial effects that the technology adopts a magnetron sputtering method, and is simple and feasible to implement, good in reproducibility, low in required cost, clean and environmentally friendly, and suitable for large-scale application; the prepared Ni submicron arrays are highly ordered and is uniform in diameter, and the Ni submicron arrays with different lengths and diameters prepared by adopting different sizes of AAO templates meet actual needs; and the prepared Ni submicron arrays are stable in structure, can significantly improve the specific surface area of an electrode active substance, and effectively improve the electrochemical performance of a lithium ion battery.