Organosilicon vapor laser pyrolysis as the method of fine forming of optical surfaces

This work is dedicated to the creation of technology to obtain required optical surfaces microrelief on glass ceramics substrate. The solution of this problem using SiO 2 local deposition by laser pyrolysis of tetraethoxysilane vapor in the presence of ozone was shown. Characteristics of experimental samples and their comparison with the results of mathematical modeling of technological process were described. The possibility of application of developed technology for production of optical substrate with large curvature radius for subsequent deposition of multi-layer coating for interference spherical mirrors was shown.