Ion implantation studies of polydiacetylene crystals

1985 
Effects of 150‐keV arsenic ion implantation on polydiacetylene crystals are characterized with respect to modifications of structural, electrical, and optical properties of the parent materials. Structural modifications are studied by means of Rutherford backscattering spectrometry, Raman spectroscopy, and x‐ray photoelectron spectroscopy. It is demonstrated that at low and intermediate fluences of implantation, structural changes are mainly associated with effects of the ion beam on the polymer side groups. dc resistivity measurements were performed in the 20 °K 190 °K) and m → 1/2 at lower temperatures (T<80 °K). Absorption spectra in the visible range from ion‐implanted thin crystalline films are also presented and discussed.
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