Device for controlling uniformity and stability of plated metal ceramic plating solution

The invention relates to a device for controlling the uniformity and the stability of a plated metal ceramic plating solution. At present, due to non-uniform components and the consequent performance instability of various plating materials in engineering, great engineering accidents and the economic loss are caused; the root reason is that the stability and the uniformity of the plating solution components are hard to control, and finally the structural performance of a plating is influenced. The device provided by the invention comprises a plating tank (1), wherein the plating tank is connected with a buffer tank (2) and connected with a liquid storage tank (4) through a pump (3); a magnetic suspension valve (5) is mounted in the plating tank and connected with a power supply source (6) through a circuit; the power supply source is connected with the pump and the plating tank. The device provided by the invention is used for controlling the stability and the uniformity of a soluble anode plating solution for plating various metal ceramics, alloys, monometals and other platings.