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Selective-area chemical vapor deposition of Ge on SiN x layers
Selective-area chemical vapor deposition of Ge on SiN x layers
2019
Yuki Ueno
Ryota Oyamada
Shun Sasaki
Tetsuya Nakai
Yasuhiko Ishikawa
Keywords:
Germanium
Silicon nitride
Materials science
Chemical vapor deposition
Silicon photonics
Optoelectronics
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