Electroluminescence of structures with self-assembled Ge(Si) nanoislands confined between strained Si layers

The electroluminescence of structures with self-assembled Ge(Si) nanoislands grown on relaxed SiGe/Si(001) buffer layers and confined between strained Si layers is studied for the first time. The electroluminescence signal from the structures is observed in the wavelength range from 1.6 to 2.0 μm, i.e., at longer wavelengths compared to those in the case of structures with Ge(Si) islands formed on Si (001) substrates. This give grounds to consider the structures with Ge(Si) islands confined between strained Si layers as candidates for the production of Si-based sources of emission at wavelengths of >1.55 μm.