Highly tunable single step selective emitter diffusion process using Silicon Ink Technology

A key feature of the Innovalight™ Cougar™ Platform is the single step selective emitter diffusion process employing Silicon Ink Technology. Both the lightly doped emitter and the heavily doped contacting areas are formed simultaneously during one diffusion process. The tuning of doping strengths of both regions is decoupled and allows for a large separation in field and contact region sheet resistance. This paper will highlight the ability to achieve a wide range of dual doping strengths using the Cougar diffusion process and the corresponding impact of this tuning on cell performance.