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Analysis of high- k HfO 2 and HfSiO 4 dielectric films
Analysis of high- k HfO 2 and HfSiO 4 dielectric films
2004
Wesley Nieveen
Bruno W. Schueler
Graham L. Goodman
P. Schnabel
John Moskito
Ian A. Mowat
Gerald Chao
Keywords:
Analytical chemistry
Dielectric
Ion beam
High-κ dielectric
Inorganic chemistry
Materials science
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