Evolution of LeTID Defects in p-Type Multicrystalline Silicon During Degradation and Regeneration

While progress has been made in developing engineering solutions and understanding light- and elevated temperature-induced degradation (LeTID) in p -type multicrystalline silicon (mc-Si), open questions remain regarding the root cause of LeTID. Previously, lifetime spectroscopy of multicrystalline silicon (mc-Si) passivated emitter and rear cell semifabricates in the unaffected and the degraded states enabled identification of the effective recombination parameters of the responsible defect. To gain further insight into the root cause of LeTID, in this paper, we measure the injection-dependent lifetime throughout degradation and regeneration and perform lifetime spectroscopy at several time points. Our analysis indicates that the change in lifetime during most of the process can be described by a corresponding change in the concentration of a single responsible defect. We also explore further exposure to light and temperature after nearly complete regeneration and a subsequent dark anneal to demonstrate that the behavior is no longer consistent with LeTID and the same defect is not detected by lifetime spectroscopy at maximum degradation. We consider our results in the context of the proposed hypotheses for LeTID and conclude that both hydrogenation and precipitate dissolution during firing are consistent with our results.