Old Web
English
Sign In
Acemap
>
Paper
>
DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE
DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE
2019
A.S. Kuprin
S. A. Leonov
V.D. Ovcharenko
E.N. Reshetnyak
V. A. Belous
R. L. Vasilenko
G.N. Tolmachova
V.I. Kovalenko
I. O. Klimenko
Keywords:
substrate bias voltage
Optoelectronics
Vacuum arc
Deposition (chemistry)
Tin
Plasma
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
24
References
0
Citations
NaN
KQI
[]