Projection lenses for high-resolution ablation with excimer lasers: high-performance, wide-field and high-UV laser power

The productive and accurate ablation of microstructures demands the precise imaging of a mask pattern onto the substrate under work. The job can be done with high performance wide field lenses as a key component of ablation equipment. The image field has dimensions of 20 to 30 mm. Typical dimensions and accuracy of the microstructures are in the order of some microns. On the other hand, the working depth of focus (DOF) has to be in the order of some 10 microns to be successful on drilling through 20 to 50 μm substrates. All these features have to be reached under the conditions of high power laser UV light. Some design principles for such systems are applied, such as optimum number of elements, minimum tolerance sensitivity, material restrictions for the lens elements as well as mechanical parts (mounting), restrictions of possible power densities on lens surfaces (including ghosts), matched quality for the manufactures system. The special applications require appropriate performance criteria for theoretical calculation and measurements, which allow to conclude the performance of the application. The base is wave front calculation and measurement (using Shack- Hartmann sensor) in UV. Derived criteria are calculated and compared with application results.© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.