Old Web
English
Sign In
Acemap
>
Paper
>
Atomistic Modeling of Interconnect Resistance in Emerging Semiconductor Technologies
Atomistic Modeling of Interconnect Resistance in Emerging Semiconductor Technologies
2017
Oscar D. Restrepo
Eduardo C. Silva
Byoung Youp Kim
Craig Child
Murali Kota
Keywords:
Electronic engineering
Semiconductor
Materials science
Engineering physics
Interconnection
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]