Design of fast deflection coils for an electron‐beam microfabrication system

The design of improved postlens deflection coils for electron‐beam microfabrication is described. These coils were made for use in a Cambridge Instrument Co. model S‐4 scanning‐electron‐microscope column. These new coils permit a 0.8‐nA 20‐kV beam to cover a 2‐mm‐square scan field with a theoretical resolution of 0.1 μm.