Micro- and nanostructures and a method of preparing a two-dimensional patterning material atoms

The present invention is in the preparation of micro- and nanostructures and processing technical field, and discloses a structure of micro-nano patterning method of preparing a two-dimensional atomic material, as follows: a two dimensional material on the substrate, at some given vacuum electron beam irradiation atoms two-dimensional material surface, and then using a plasma etching to achieve a two dimensional patterning material; the electron beam energy and dose ranges of 100 eV ~ 30 keV and 102 ~ 108μC ​​/ cm2, the degree of vacuum to 1 × 10-7 ~ 5 × 10-3 Pa. The wet method without undergoing the process, the small size of the pattern produced, can be processed in the substrate or tile or floating cover on the micro or nano-structured substrate surface concave convex dimensional atomic material.