An optical system for lithographic production of structures

An optical system (1) for the lithographic production of structures having a projection optical system (8) for guiding a structure generating write beam to a write focus (9) in the region of a substrate surface (10) in a substrate plane (12). A deflector (5) serves for deflecting the write focus (9) of the writing light beam within a writing field (13) in the region of the substrate surface (10). A preview optics (14) is used for imaging a preview field (15) in the region of the substrate surface (10). The preview box (15) has an area that is larger by at least a factor of 10 than a surface of the writing field (13). The projection optical system (8) and the thumbnail optics (14) are carried by a common frame (16). A substrate holder (18) is displaceable in a plane (xy) parallel to the substrate surface (10) in two translational degrees of freedom (x, y). Further, the system (1) has a control unit (27) having a memory (28), in the relative coordinates of a position of the writing field (13) relative to the position of the preview field (15) are stored. This results in an optical system in which a positioning of a substrate which is processed in the lithographic pattern generation, is achieved with good accuracy.