Advanced electric-field scanning probe lithography on molecular resist using active cantilever
2015
The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of
many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated,
piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform
able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of
molecular resists using active scanning probes represents a promising path circumventing the problems in today’s
radiation-based lithography. Here, we present examples of practical applications of the previously published electric field
based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop
SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including
optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining
positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature
the practical applicability of the lithographic processes.
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