Old Web
English
Sign In
Acemap
>
Paper
>
Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing | NIST
Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing | NIST
2007
P Lysaght
Joseph C. Woicik
Daniel Fischer
G. Bersuker
Joel Barnett
Brendan Foran
H.-H. Tseng
Raj Jammy
Keywords:
Thermal
NIST
Nuclear physics
Condensed matter physics
Physics
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]