Design and fabrication technology of thinned backside-excited CCD imagers and the family of intensified electron-bombarded CCD image tubes

This paper sums up the results of more than 10 years experience in design and manufacturing of thinned backside illuminated CCDs of different types. Based upon the EB-CCDs created, the family of intensified electron-bombarded CCD image tubes has been designed, fabricated and tested. This family includes: the single-stage Gen I-type EB-CCD devices with the 532*580 and 780*580 pixels CCDs; the `hybrid' (the EB-CCD tube plus Gen I image intensifier) devices; and the EB-CCD tubes with the 40 mm photocathode and image demagnification factor 3:1. The results of tests of these devices are presented and discussed. Besides, the near future projects concerning EB-CCD tubes with the 80 mm photocathode and with image demagnification factor 5:1, and EB-CCD tubes with solar blind photocathodes for the UV and EUV applications are briefly described.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.