Method of treating a semiconductor structure and method of manufacturing a semiconductor capacitor using the same

As to how to treat the surface of the semiconductor structure and using it relates to a method of producing a semiconductor capacitor, while having an aspect ratio of higher height compared to the width as the lower electrode of the cylinder type semiconductor structure comprising a pattern to be disposed adjacent to each other when washing the solution uses a small surface tension as compared to water. And, Dry the semiconductor structure in the vapor atmosphere of isopropyl alcohol. Therefore, not even support the patterns are substantially deflected by a surface tension to the solution in contact between the action pattern.