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Effect of Anneal Process on Trap Properties in Metal/High-k Gate MOSFETs through RTN Characterization
Effect of Anneal Process on Trap Properties in Metal/High-k Gate MOSFETs through RTN Characterization
2012
H. F. Chiu
San-Lein Wu
Y.S. Chang
S. J. Chang
S. C. Tsai
Po Chin Huang
O. Cheng
Keywords:
High-κ dielectric
Annealing (metallurgy)
Analytical chemistry
Metal
Materials science
Optoelectronics
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