Photophysical, Photostability, and ROS Generation Properties of New Trifluoromethylated Quinoline-Phenol Schiff Bases

A new series of ten examples of (E)-2-(((2-alkyl(aryl/heteroaryl)-4-(trifluoromethyl)quinolin-6-yl)imino)methyl)phenols (Schiff bases), was easy synthesized at yields of up to 91% from the reactions between a series of 2-(R-substituted) 6-amino-4-(trifluoromethyl)quinolines and 4(5)-R1-substituted salicylaldehydes – in which alkyl/aryl/heteroaryl for 2-(R)-substituents are Me, Ph, 4-MeC6H4, 4-FC6H4, 4-NO2C6H4, and 2-furyl, and (R1)-substituents are 5-NEt2, 5-OCH3, 4-Br, and 4-NO2. The compounds are fully characterized by 1H-, 13C-, and 19F-NMR spectroscopy and SC-XRD. Complementarily, the photophysical, photostability, and reactive oxygen species (ROS) generation properties of these novel trifluoromethylated Schiff bases are evaluated.