Superconducting magnesium diboride films on Si with Tc0∼24 K grown via vacuum annealing from stoichiometric precursors

Superconducting magnesium diboride films with Tc0∼24 K and sharp transition ∼1 K were prepared on Si by pulsed-laser deposition from stoichiometric MgB2 target. Contrary to previous reports, anneals at 630 °C and a background of 2×10−4 Ar/4%H2 were performed without the requirement of Mg vapor or Mg cap layer. This integration of superconducting MgB2 film on Si may thus prove enabling in superconductor-semiconductor device applications. Images of surface morphology and cross-section profiles by scanning electron microscopy show that the films have a uniform surface morphology and thickness. Energy-dispersive spectroscopy study reveals these films were contaminated with oxygen, originating either from the growth environment or from sample exposure to air. The oxygen contamination may account for the low Tc for those in situ annealed films, while the use of Si as a substrate does not result in a decrease in Tc as compared to other substrates.