Adhesion of tungsten particles on rough tungsten surfaces using Atomic Force Microscopy

Abstract Adhesion forces between tungsten spherical microparticles and tungsten substrates with different roughnesses have been measured using the Atomic Force Microscopy (AFM) colloidal probe technique. Mean roughnesses of the tungsten substrates were measured by AFM and were ranked in three categories i.e. nanoscale, sub-microscale and microscale roughnesses. Experimental Hamaker constant of 37 ± 3.5 × 10 − 20 J has been obtained using a spherical tungsten particle of 10.5  μ m in radius and a tungsten substrate with nanoscale root-mean-square roughness of r m s = 11.5 nm. It was shown that larger roughness of the order r m s = 712 nm induces a two order of magnitude decrease on the adhesion of tungsten microparticles compared to a smooth tungsten surface with nanoscale roughness. Comparison with the van der Waals-based adhesion force model of Rabinovich which integrates the roughness of surfaces showed good agreement with experimental pull-off forces even when roughness of the substrate is close to the micrometer range. In such case, measurements have shown that dependency of adhesion force with particle size (in the micrometer range) has a secondary influence compared to the roughness of surfaces.