Precise Analysis of Si/Graded-Si1-xGex/Si1-xGex Heterostructure Films Grown by Reduced Pressure Chemical Vapor Deposition Using Spectroscopic Ellipsometry

Precise analysis of Si/graded-Si1-xGex/ Si1-xGex heterostructure films grown by reduced pressure chemical vapor deposition using spectroscopic ellipsometry J.J. Seo, S.S. Choi, H.D. Yang, J.Y. Kim, J.W. Yang, T.H. Han*, D.H. Cho*, K.H. Shim Department of Semiconductor Science and Technology, Semiconductor Physics Research Center Chonbuk National University, 664-14 Deokjindong, Deokjinku, Jeonju, 561-756 Korea *R&D Center, Tachyonics, Seoul, Korea