Old Web
English
Sign In
Acemap
>
Paper
>
CONTROLLING THE SILICON NITRfDE FILM DENSITY FOR ULTRAHIGH-RATE DEPOSITION OF TOP QUALITY ANTIREFLECTION COATINGS
CONTROLLING THE SILICON NITRfDE FILM DENSITY FOR ULTRAHIGH-RATE DEPOSITION OF TOP QUALITY ANTIREFLECTION COATINGS
2005
W.M.M. Kessels
P.J. van den Oever
Bram Hoex
R. C. M. Bosch
A. J. M. van Erven
Martin Dinant Bijker
M.C.M. van de Sanden
Keywords:
Silicon nitride
Electronic engineering
Engineering
Monocrystalline silicon
Silicon
Composite material
Correction
Cite
Save
Machine Reading By IdeaReader
1
References
0
Citations
NaN
KQI
[]