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Multi‐instrument characterization of HiPIMS and DC magnetron sputtered tungsten and copper films
Multi‐instrument characterization of HiPIMS and DC magnetron sputtered tungsten and copper films
2020
Tuhin Roychowdhury
Dhruv Shah
Varun Jain
Dhananjay I. Patel
Berg Dodson
William Skinner
James N. Hilfiker
Stacey J. Smith
Matthew R. Linford
Keywords:
Copper
Tungsten
Analytical chemistry
High-power impulse magnetron sputtering
Chemistry
Metallurgy
Cavity magnetron
Correction
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