Influence of Different Acid and Alkaline Slurry on Fixed Abrasive Polishing of Zinc Sulfide Crystal

Zinc sulfide crystal is an important infrared material,which is widely used in the field of infrared imaging,missile guidance,infrared countermeasure and so on. Slurry can affect the wafer surface quality and material removal rate( MRR) by chemical reaction with workpiece and polishing pad. Ethylenediamine( EDA),sodium hydroxide,hydrochloric acid,citric acid was adopted to prepare slurry,respectively.Material removal rate,surface roughness and surface morphology were investigated in fixed abrasive polishing of zinc sulfide crystal. The results indicate that MRR can be obtained higher by acid slurry than that of alkaline slurry. Citric acid slurry is effective for fixed abrasive polishing of zinc sulfide crystal,obtaining a fine surface quality with surface roughness Sa of 4. 22 nm and high MRR of 437 nm / min.