Structural, optical, and electrical properties of NiO-In composite films deposited by radio frequency cosputtering

In-doped NiO films with indium concentrations ranging from 0 to 30.3 at. % were deposited on glass substrates to investigate corresponding structural, optical, and electrical property variations. The x-ray diffraction patterns show that all films display only NiO peaks. When In atoms were added to NiO films, the NiO peaks shifted to lower angles, indicating that the lattice parameters of the films increased due to the larger In ions substituting for the smaller Ni ions. An electrical resistivity (ρ) too high to be measured occurred when the indium concentration in the NiO film was less than 15.6 at. %. The ρ value dropped significantly to 0.06 Ω·cm as the indium concentration increased to 26.9 at. %. Upon further raising the In to 30.3 at. %, the ρ value decreased further to 0.01 Ω·cm. All the In-doped NiO films showed n-type conduction. The transmittance of undoped NiO film is as high as 96%. On raising the indium concentration to 15.6, 19.9, 26.9, and 30.3 at. %, the transmittances decreased further to 68%, 62%, 57%, and 47%, respectively. Introducing higher In concentrations improved the films’ thermal stability of electrical resistivity.