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AlGaN/GaN MIS-HEMT with ultrathin barrier using PECVD SiN as passivation and gate-insulating layer
AlGaN/GaN MIS-HEMT with ultrathin barrier using PECVD SiN as passivation and gate-insulating layer
2015
Zheli Wang
Jianjun Zhou
Cen Kong
Tangsheng Chen
Keywords:
AND gate
Passivation
Electronic engineering
High-electron-mobility transistor
Plasma-enhanced chemical vapor deposition
Materials science
Optoelectronics
algan gan
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