Fluidity dependence of deprotonation kinetics of chemically amplified resist
2014
Chemically amplified resists have been widely used in the mass production line. An acid generation mechanism induced
by ionizing radiation with extreme ultraviolet (EUV) and electron beam is an important issue for improvement of the
resist performance such as sensitivity, roughness, and resolution below 16 nm. However, the details of deprotonation
kinetics from the ionized resist solid film immediately after the ionization have been still unclear. In this study, pulse
radiolysis of highly concentrated poly(4-hydroxystylene) (PHS) solutions was performed. The viscosity dependence on
the deprotonation dynamics of the ionized concentrated solutions was investigated to clarify the proton generation of
ionized PHS in a medium with low mobility. The deprotonation from the PHS radical cation becomes slower with
increasing PHS concentration. It is suggested that the deprotonation reaction is slower in a less mobile medium because
of decrease of the molecular motions.
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