Novel MEMS Infrared Radiation Source Based on Photonic Crystal Structure

Based on photonic crystal and surface plasmon resonance(SPR) technology,a novel tunable MEMS infrared radiation(IR) source was studied and fabricated.Compared with conventional infrared radiation source,the infrared spectrum of the novel infrared radiation source is narrow and tunable.Its substrate is Si,and SiO2-Cr-Au structure is formed on Si surface.Then 2 μm-depth periodic holes array is etched on Si-SiO2-Cr-Au structure whose distances between the holes with diameters of 3.5 μm and 4 μm are 7 μm and 8 μm respectively.By theoretical calculation,simulation with finite-difference time-domain(FDTD) software and measurement using FTIR(Magna 550),the results show that the novel MEMS infrared radiation source is of narrow peak,and reflection peak wavelength is close to the distance between the holes.Furthermore,transmission strength is inverse to the hole depth in a certain scope,it is found that the deeper the depth of the hole,the weaker the SPR effect within certain range.