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NiSi/SiO2界面近傍の化学結合状態およびNiSi 層の実効仕事関数評価
NiSi/SiO2界面近傍の化学結合状態およびNiSi 層の実効仕事関数評価
2006
hirosi miti yosinaga
daisuke higasi
hideki murakami
teruo oota
yuuki munetaka
seiitirou higasi
seiiti miyazaki
takasi sati aoyama
kimihiko hosaka
kentarou sibahara
Keywords:
Work function
Crystallography
X-ray photoelectron spectroscopy
Materials science
raman scattering spectroscopy
Analytical chemistry
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