Construction of microcolumn system and its application to nanolithography

Abstract We have constructed microcolumn system that can overcome the limitation of current e-beam lithography technology and tested them through experiments. Electron-optical lenses consist of multiple electrodes. Silicon electrodes have been fabricated by micromachining technology and assembled with Pyrex glass by anodic bonding. Electron-optical lens was equipped in UHV(Ultra High Vacuum) chamber. We have observed the emission characteristics of electrons from STM(Scanning Tunneling Microscope) tip and performed lithography with focused electrons. PMMA(poly-methylmethacrylate) was used for e-beam resist and 0.13 μm isolated line was delineated on PMMA(poly-methylmethacrylate) with the microcolumn system.