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New Patterning Technology by Integrating Atomic Layer Deposition Process to the Etching Flow
New Patterning Technology by Integrating Atomic Layer Deposition Process to the Etching Flow
2017
Takayuki Katsunuma
Toru Hisamatsu
Yoshihide Kihara
Masanobu Honda
Keywords:
Chemistry
Inorganic chemistry
Analytical chemistry
Atomic layer deposition
Etching
Nanotechnology
Flow (psychology)
Correction
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