Device for electron beam

The invention relates to a device for electron beam comprising a vacuum working chamber (2), a Axialstrahler (6) for generating an electron beam (7), by means of which a material to be vaporized (5) can be heated, and between the material (5) and a substrate to be coated (3) disposed aperture (9) comprising at least one Dampfapertur (10) which passes through the material vapor to the substrate (3), wherein the diaphragm (9) comprises a magnet system (14), by means of which the electron beam (7 ) is deflectable by the Dampfapertur (10) on the material to be evaporated (5).