Substrate processing unit

The substrate processing apparatus includes a chamber providing an interior space consisting of a process to the substrate; A support member that is disposed within the chamber supports a substrate; The support showerhead provided side by side with the support member to the upper portion of the member; And it includes an elevating member for adjusting the distance between the support member and the shower head and to support the shower head, lifting the shower head. The chamber is provided with the support member, a process chamber consisting of a process by the plasma; And there is provided at the upper portion of the processing chamber, by said coil and provided with a generating chamber in which the plasma is generated, the shower head may be provided on the process chamber. The upper end of the elevating member is connected to the top portion of the generating chamber, a lower end of the elevating member is connected to the showerhead, the showerhead can be a disk shape. Shower head, the lifting member