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Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation
Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation
1994
John H. Booske
L. Zhan
R. F. Cooper
J. L. Shohet
K. Shenai
D. Dallman
Matthew Goeckner
R. Breun
W.N.G. Hitchon
E. Wickesberg
R. Speth
J. Jacobs
G. Was
Keywords:
Nuclear magnetic resonance
Ion implantation
Ceramic
CMOS
Plasma
Physics
Ion beam deposition
Analytical chemistry
Flue gas
Silicon
Atomic physics
Optoelectronics
Correction
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