Apparatus and method reduces the erosion rate of the exposed surface to a halogen containing plasma

The present invention provides a ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. As A is resistant to erosion by halogen-containing plasma material, and zirconium oxide at a concentration of from about 0.1 to about 65 mol%, from about 99.9 to about 35 mol% of the concentration yttrium oxide, preferably from about 30 a composite powder based containing 40 mol% of zirconium oxide and 70～60Mol% of yttrium oxide, the first method, molding the composite powder, a method for obtaining a sintered body by sintering, the second method, the surface of the substrate made of metal or ceramics, a method of coating the composition of the composite powder. .FIELD 1A