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High-K/Metal Gate MOSFETsにおける新しいレイアウト依存性(IEDM特集(先端CMOSデバイス・プロセス技術))
High-K/Metal Gate MOSFETsにおける新しいレイアウト依存性(IEDM特集(先端CMOSデバイス・プロセス技術))
2012
masasi hamaguti
Deleep R. Nair
D. Jaeger
takasi nisimura
Wai-kin Li
M-H. Na
Christophe Bernicot
J. Liang
Knut Stahrenberg
K. Kim
M. Eller
K-C. Lee
T. Iwamoto
Y-W. Teh
sadayuki mori
yasuo takasu
J. H. Park
Liyang Song
N-S. Kim
S. Kohler
H. Kothari
J.-P. Han
S. Miyake
F. Arnaud
K. Barla
M. Sherony
Ricardo A. Donaton
M. Celik
katura miyasita
Vijay Narayanan
Richard A. Wachnik
Michael P. Chudzik
John Sudijono
M. Sekine
Steven G. Johnson
W. Neumueller
R. Sampson
E. Kaste
Ramachandra Divakaruni
si rin matuoka
Keywords:
Gate oxide
Artificial intelligence
Computer science
Metal gate
Machine learning
High-κ dielectric
Gate dielectric
Electronic engineering
MOSFET
Pattern recognition
Optoelectronics
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