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Material Selection for the Metal Gate/High-k Transistors
Material Selection for the Metal Gate/High-k Transistors
2004
Yasushi Akasaka
Kazuhiro Miyagawa
A. Kariya
H. Shoji
T. Aoyama
S Kume
M. Shigeta
O. Ogawa
Kenji Shiraishi
Akira Uedono
Kikuo Yamabe
Toyohiro Chikyow
Kiyomi Nakajima
Mitsuo Yasuhira
Keisaku Yamada
Tsunetoshi Arikado
Keywords:
High-κ dielectric
Metal gate
Electronic engineering
Transistor
Material selection
Materials science
Optoelectronics
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